TM

Takahiro Matsuo

Sumitomo Electric Industries: 23 patents #806 of 21,551Top 4%
KM Konica Minolta: 15 patents #104 of 2,718Top 4%
PA Panasonic: 7 patents #3,841 of 21,108Top 20%
Kubota: 7 patents #292 of 2,059Top 15%
SC Sumitomo Chemical: 4 patents #1,124 of 4,033Top 30%
YA Yazaki: 3 patents #1,239 of 3,427Top 40%
Dai Nippon Printing Co.: 2 patents #976 of 2,222Top 45%
IH Ihi: 2 patents #401 of 1,178Top 35%
ST Semiconductor Leading Edge Technologies: 2 patents #2 of 46Top 5%
ML Mitsubishi Petrochemical Company Limited: 1 patents #291 of 670Top 45%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
KM Konica Minolta: 1 patents #986 of 1,361Top 75%
DC Dainippon Screen Mfg. Co.: 1 patents #531 of 977Top 55%
📍 Osaka, JP: #65 of 258 inventorsTop 30%
Overall (All Time): #32,534 of 4,157,543Top 1%
66
Patents All Time

Issued Patents All Time

Showing 51–66 of 66 patents

Patent #TitleCo-InventorsDate
6081978 Resin-encapsulated semiconductor device producing apparatus and method Masaki Utsumi, Hiroshi Hidaka 2000-07-04
5982623 Module for packaged IC Yoshio Maruyama, Osamu Hikita, Shinji Kadoriku 1999-11-09
5965325 Pattern forming material and pattern forming method Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka 1999-10-12
5928840 Patterning material and patterning method Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka 1999-07-27
5866302 Pattern formation method Koji Matsuoka, Akiko Katsuyama, Masayuki Endo 1999-02-02
5773174 Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and surface modification layer width Taichi Koizumi, Masayuki Endo 1998-06-30
5763124 Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and thermal annealing parameter Taichi Koizumi 1998-06-09
5756242 Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameter Taichi Koizumi, Masayuki Endo 1998-05-26
5741628 Method of forming micropatterns by having a resist film absorb water Kazuhiro Yamashita, Masayuki Endo, Masaru Sasago 1998-04-21
5679500 Method of forming micropatterns utilizing silylation and overall energy beam exposure Kazuhiro Yamashita, Masayuki Endo, Masaru Sasago 1997-10-21
5658711 Method of forming micropatterns Kazuhiro Yamashita, Masayuki Endo, Masaru Sasago 1997-08-19
5301137 Circuit for fixed point or floating point arithmetic operations Toshiki Fujiyama, Toru Kengaku 1994-04-05
5118771 Erasable optical disk having an improved optically transparent substrate Takao Inoue 1992-06-02
4983335 Method for producing transparent plastic article Takao Inoue 1991-01-08
4734477 Method for cast molding plastic substrate Takao Inoue, Tadashi Sakairi, Mitsutoshi Aritomi, Tadao Takeyama 1988-03-29
4643911 Method for forming light-shield coat on lenses Takao Inoue, Youichi Nakamura 1987-02-17