| 12360135 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a projection |
Abderrezak Marzaki, Virginie Bidal, Pascal Fornara |
2025-07-15 |
| 11536872 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a project |
Abderrezak Marzaki, Virginie Bidal, Pascal Fornara |
2022-12-27 |
| 10379254 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a projection |
Abderrezak Marzaki, Virginie Bidal, Pascal Fornara |
2019-08-13 |
| 9472413 |
Method for producing a pattern in an integrated circuit and corresponding integrated circuit |
Abderrezak Marzaki |
2016-10-18 |
| 9076878 |
Non-volatile memory with vertical selection transistors |
Francesco La Rosa, Stephan Niel, Arnaud Regnier |
2015-07-07 |
| 8901634 |
Nonvolatile memory cells with a vertical selection gate of variable depth |
Francesco La Rosa, Stephan Niel, Arnaud Regnier |
2014-12-02 |