| 12360135 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a projection |
Abderrezak Marzaki, Yoann Goasduff, Pascal Fornara |
2025-07-15 |
| 11536872 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a project |
Abderrezak Marzaki, Yoann Goasduff, Pascal Fornara |
2022-12-27 |
| 10379254 |
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a projection |
Abderrezak Marzaki, Yoann Goasduff, Pascal Fornara |
2019-08-13 |
| 8881090 |
Method for fabrication of an integrated circuit in a technology reduced with respect to a native technology, and corresponding integrated circuit |
Guilhem Bouton |
2014-11-04 |
| 7675106 |
Non-volatile reprogrammable memory |
Rachid Bouchakour, Philippe Candelier, Richard Fournel, Philippe Gendrier, Romain Laffont +3 more |
2010-03-09 |