KN

Ken Nakajima

SO Sony: 45 patents #569 of 25,231Top 3%
NE Nec: 13 patents #940 of 14,502Top 7%
EB Ebara: 5 patents #423 of 1,611Top 30%
MS Mitsubishi Materials Silicon: 2 patents #21 of 116Top 20%
ZO Zojirushi: 2 patents #12 of 73Top 20%
EC Ebara Research Co.: 2 patents #9 of 45Top 20%
SM Smc: 1 patents #485 of 737Top 70%
SU Sumco: 1 patents #248 of 464Top 55%
PA Panasonic: 1 patents #13,264 of 21,108Top 65%
KT Kabushiki Kaisha Toshiba: 1 patents #13,537 of 21,451Top 65%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
Overall (All Time): #27,860 of 4,157,543Top 1%
72
Patents All Time

Issued Patents All Time

Showing 51–72 of 72 patents

Patent #TitleCo-InventorsDate
6611287 Camera signal processing apparatus and camera signal processing method Toshihisa Yamamoto 2003-08-26
6547875 Epitaxial wafer and a method for manufacturing the same Tamiya Karashima, Hiroyuki Shiraki 2003-04-15
6503671 Electron beam writing method 2003-01-07
6417516 Electron beam lithographing method and apparatus thereof 2002-07-09
6243487 Pattern exposure method using electron beam 2001-06-05
6232612 Variable shaped electron beam exposure system and method of writing a pattern by a variable shaped electron beam 2001-05-15
6093932 Method of writing any patterns on a resist by an electron beam exposure and electron beam exposure system 2000-07-25
6042971 Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask Takao Tamura, Hiroshi Yamashita, Hiroshi Nozue 2000-03-28
6010827 Electron beam exposure utilizing pre-processed mask pattern 2000-01-04
6007949 Method of extracting a mask pattern for an electron beam exposure 1999-12-28
5998797 Mask for electron beam exposure and electron beam drawing method 1999-12-07
5940127 Imager including a solid state imaging device with optical low pass filter 1999-08-17
5935744 Method of drawing patterns through electron beam exposure utilizing target subpatterns and varied exposure quantity 1999-08-10
5897978 Mask data generating method and mask for an electron beam exposure system 1999-04-27
5895736 Method of transferring miniature pattern by using electron beam lithography system without proximity effect 1999-04-20
5670094 Method of and apparatus for producing ozonized water Kenichi Sasaki, Takayuki Saito, Mitsuru Imai 1997-09-23
5671023 Gamma correction circuit Kazuhiko Nishiwaki 1997-09-23
5528047 Electron beam exposure apparatus with improved drawing precision 1996-06-18
5450582 Network system with a plurality of nodes for administrating communications terminals Mitsuo Suzuki 1995-09-12
5352359 Ultraviolet reactor with mixing baffle plates Hiroshi Nagai, Yukio Ikeda, Noriyoshi Mashimo 1994-10-04
5190627 Process for removing dissolved oxygen from water and system therefor Takayuki Saito, Hidenobu Arimitsu, Yoko Iwase, Hiroyuki Shima 1993-03-02
5073268 Process and system for purifying pure water or ultrapure water Takayuki Saito, Yoki Iwase, Yukio Ikeda, Hiroyuki Shima 1991-12-17