Hidetoshi Ohnuma — 13 Patents at Sony

Hidetoshi Ohnuma has been granted 13 US patents while listed as an inventor at Sony. The first was granted in 1998 and the most recent in July 2012. Hidetoshi Ohnuma ranks #362,438 of 4,157,543 US inventors in our database (top 8.7%). Patent records list Hidetoshi Ohnuma in Yokohama, JP.

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Showing 1–13 of 13 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
8221942	Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device	Mikio Oka, Kaoru Koike, Kensuke Tsuchiya	2012-07-17	$81,000
7200834	Exposure pattern forming method and exposure pattern	Kazuhisa Ogawa	2007-04-03	$995,000
7165235	Exposure pattern forming method and exposure pattern	Kazuhisa Ogawa	2007-01-16	$1,453,000
7139996	Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device	Kazuyoshi Kawahara	2006-11-21	$926,000
7000216	Exposure pattern forming method and exposure pattern	Kazuhisa Ogawa	2006-02-14	$745,000
6928636	Rule based OPC evaluating method and simulation-based OPC model evaluating method	—	2005-08-09	$577,000
6924068	Photomask fabrication method, photomask, and exposure method thereof	—	2005-08-02	$667,000
6492078	Correcting method of exposure pattern, exposure method, exposure system, photomask and semiconductor device	—	2002-12-10	$483,000
6391501	Pattern generating method and apparatus	—	2002-05-21	$962,000
6370441	Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices	—	2002-04-09	$959,000
6144760	Exposure data correction method, exposing method, photomask, semiconductor device, exposure data correction apparatus, exposure apparatus, and manufacturing apparatus of semiconductor device	—	2000-11-07	$2,279,000
5885748	Method of exposing, with correction of pattern data used to draw photomask to overcome proximity effects	—	1999-03-23	$583,000
5792581	Method of correcting pattern data for drawing photomask to overcome proximity effects	—	1998-08-11	$383,000

Hidetoshi Ohnuma — 13 Patents

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