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Home › Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices

Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devices

US Patent 6370441 · Granted Apr 9, 2002

Estimated economic value: $959,000 ⓘ

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