VS

Vivek Singh

SL Siemens Healthcare Limited: 49 patents #13 of 1,907Top 1%
IN Intel: 35 patents #1,016 of 30,777Top 4%
SD Siemens Healthcare Diagnostics: 8 patents #43 of 659Top 7%
SA Siemens Healthineers Ag: 7 patents #22 of 740Top 3%
Schlumberger Technology: 7 patents #897 of 7,293Top 15%
JN Juniper Networks: 5 patents #640 of 2,602Top 25%
NU Nxp Usa: 4 patents #422 of 2,066Top 25%
NV NVIDIA: 2 patents #2,855 of 7,811Top 40%
KA Kodak Alaris: 2 patents #72 of 159Top 50%
UF University Of South Florida: 2 patents #543 of 1,794Top 35%
NL Naffa Innovations Private Limited: 1 patents #3 of 5Top 60%
IA Innoplexus Ag: 1 patents #31 of 68Top 50%
CE Certainteed: 1 patents #267 of 431Top 65%
BE Bloom Energy: 1 patents #197 of 315Top 65%
AL Ani Technologies Private Limited: 1 patents #23 of 48Top 50%
AE American Express: 1 patents #950 of 1,774Top 55%
WH Whirlpool: 1 patents #2,112 of 3,480Top 65%
Broadcom: 1 patents #5,847 of 9,346Top 65%
AE Alliance For Sustainable Energy: 1 patents #331 of 746Top 45%
NB Nxp B.V.: 1 patents #1,722 of 3,591Top 50%
📍 Princeton, NJ: #9 of 2,186 inventorsTop 1%
🗺 New Jersey: #110 of 69,400 inventorsTop 1%
Overall (All Time): #7,601 of 4,157,543Top 1%
136
Patents All Time

Issued Patents All Time

Showing 126–136 of 136 patents

Patent #TitleCo-InventorsDate
7606666 System and method for performing oilfield drilling operations using visualization techniques Dmitriy Repin, Clinton D. Chapman, James C. Brannigan 2009-10-20
7603648 Mask design using library of corrections Peng Liu, Bin Hu 2009-10-13
7523435 Pixelated masks for high resolution photolithography Srinivas Bollepalli, Paul Davids 2009-04-21
7512926 Phase-shifting masks with sub-wavelength diffractive optical elements Bin Hu, Yan Borodovsky 2009-03-31
7325223 Modification of pixelated photolithography masks based on electric fields Bin Hu, Victor P. Bashurin, Yuri D. Bogunenko 2008-01-29
7294437 Quick and accurate modeling of transmitted field Peng Liu 2007-11-13
6993742 Thermal proximity effects in lithography David Fryer, Thanh N. Phung 2006-01-31
6898781 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography John E. Bjorkholm, Francisco Leon 2005-05-24
6625802 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography John E. Bjorkholm, Francisco Leon 2003-09-23
6373553 Photo-lithographic method to print a line-space pattern with a pitch equal to half the pitch of the mask 2002-04-16
5840448 Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance Yan Borodovsky 1998-11-24