| 7054469 |
Passivation layer structure |
Siegfried Röhl, Paul-Werner von Basse, Thorsten Sasse, Heinz Opolka |
2006-05-30 |
| 6714392 |
Electronic component and utilization of a guard structure contained therein |
Heinz Opolka, Paul-Werner von Basse, Rainer Grossmann, Christian Peters, Reinhard Fischbach +9 more |
2004-03-30 |
| 6668072 |
Method for producing a reference image for pattern recognition tasks |
Gerd Hribernig, Wolfgang Marius, Christofer Hierold |
2003-12-23 |
| 6664612 |
Semiconductor component having double passivating layers formed of two passivating layers of different dielectric materials |
Josef Willer, Paul-Werner von Basse |
2003-12-16 |
| 6401544 |
Micromechanical component protected from environmental influences |
Robert Aigner, Christofer Hierold, Hergen Kapels, Stefan Kolb, Dieter Maier-Schneider +3 more |
2002-06-11 |
| 6365888 |
Method for capacitive image acquisition |
Paul-Werner von Basse, Josef Willer, Stephan Marksteiner |
2002-04-02 |
| 6320239 |
Surface micromachined ultrasonic transducer |
Peter-Christian Eccardt, Kurt W. Niederer, Martin Vossiek, Thomas Kolpin |
2001-11-20 |
| 6159762 |
Process for producing micromechanical sensors |
Christofer Hierold, Ulrich Naher |
2000-12-12 |
| 6140689 |
Micromechanical sensor |
Ulrich Naher, Christofer Hierold |
2000-10-31 |
| 6094985 |
Rotation rate sensor |
Hergen Kapels, Christofer Hierold, Max Steger, Reinhold Noe, Ulrich Naher |
2000-08-01 |
| 6020050 |
Semiconductor chip |
Ulrich Naher, Adrian Berthold, Christofer Hierold |
2000-02-01 |
| 5974895 |
Capacitively measuring sensor and readout circuit |
Max Steger, Christofer Hierold, Reinhold Noe |
1999-11-02 |
| 5918110 |
Method for manufacturing a combination of a pressure sensor and an electrochemical sensor |
Klaus Abraham-Fuchs, Walter Gumbrecht, Christofer Hierold |
1999-06-29 |
| 5883779 |
Pressure sensor |
Ralf Catanescu |
1999-03-16 |
| 5834332 |
Micromechanical semiconductor components and manufacturing method therefor |
Christofer Hierold, Markus Biebl, Helmut Klose |
1998-11-10 |
| 5760455 |
Micromechanical semiconductor component and manufacturing method therefor |
Christofer Hierold, Markus Biebl, Helmut Klose |
1998-06-02 |
| 5700702 |
Method for manufacturing an acceleration sensor |
Helmut Klose, Markus Biebl, Christofer Hierold |
1997-12-23 |
| 5662772 |
Method for the selective removal of silicon dioxide |
Ulrich Naeher, Christofer Hierold |
1997-09-02 |
| 5631428 |
Capacitive semiconductor pressure sensor |
Ralf Catanescu, Christofer Hierold |
1997-05-20 |
| 5450754 |
Pressure sensor |
Markus Biebl, Helmut Klose |
1995-09-19 |
| 5447067 |
Acceleration sensor and method for manufacturing same |
Markus Biebl, Helmut Klose |
1995-09-05 |
| 5431051 |
Tunnel effect acceleration sensor |
Markus Biebl, Helmut Klose |
1995-07-11 |
| 5373181 |
Sensor for sensing fingerpaints and method for producing the sensor |
Markus Biebl, Helmut Klose |
1994-12-13 |
