HK

Hiroyuki Kamada

SC Shin-Etsu Handotai Co.: 9 patents #84 of 679Top 15%
Sumitomo Electric Industries: 4 patents #6,367 of 21,551Top 30%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
KE Keihin: 1 patents #237 of 596Top 40%
📍 Nishigo, JP: #2 of 14 inventorsTop 15%
Overall (All Time): #281,182 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
12227872 Single-crystal pulling apparatus and single-crystal pulling method Kiyotaka Takano, Wataru Yajima, Kosei Sugawara, Tomohiko Ohta 2025-02-18
12188153 Single-crystal pulling apparatus with saddle-shaped superconducting coils and single-crystal pulling method Kiyotaka Takano, Kosei Sugawara, Takahide ONAI, Tomohiko Ohta 2025-01-07
11081556 Silicon carbide semiconductor device 2021-08-03
10400353 Method for controlling resistivity and N-type silicon single crystal Ryoji Hoshi, Kiyotaka Takano 2019-09-03
10066322 Method for heat treatment of silicon single crystal wafer Ryoji Hoshi 2018-09-04
9938640 Method for heat treatment of silicon single crystal wafer Ryoji Hoshi 2018-04-10
9850595 Method for heat treatment of silicon single crystal wafer Ryoji Hoshi 2017-12-26
9773710 Method for evaluating concentration of defect in silicon single crystal substrate Ryoji Hoshi 2017-09-26
9650725 Method for manufacturing a defect-controlled low-oxygen concentration silicon single crystal wafer Ryoji Hoshi, Kosei Sugawara 2017-05-16
9111883 Method for evaluating silicon single crystal and method for manufacturing silicon single crystal Ryoji Hoshi, Suguru Matsumoto 2015-08-18
8247875 Fabrication method of semiconductor device 2012-08-21
7851316 Fabrication method of semiconductor device 2010-12-14
7544899 Printed circuit board Akira Sato 2009-06-09
7294569 Semiconductor device fabrication method and semiconductor device fabrication system for minimizing film-thickness variations 2007-11-13
6914000 Polishing method, polishing system and process-managing system 2005-07-05
6395598 Semiconductor device and method for fabricating the same Takehiro Hirai, Hiroyuki Kawahara, Ichiro Nakao 2002-05-28