| 6900144 |
Film-forming surface reforming method and semiconductor device manufacturing method |
Kazuo Maeda, Takayoshi Azumi, Kiyotaka Sasaki |
2005-05-31 |
| 6548426 |
Method for improving a quality of dielectric layer and semiconductor device |
Kazuo Maeda |
2003-04-15 |
| 6225236 |
Method for reforming undercoating surface and method for production of semiconductor device |
Yuhko Nishimoto |
2001-05-01 |
| 6133162 |
Method of forming a film by using plasmanized process gas containing gaseous H.sub.2 O and an auxiliary gas in a semiconductor device |
Junichi Aoki, Kazuo Maeda |
2000-10-17 |
| 6124210 |
Method of cleaning surface of substrate and method of manufacturing semiconductor device |
Hiroshi Chino, Hideya Matsumoto, Shoji Ohgawara |
2000-09-26 |
| 5834730 |
Plasma processing equipment and gas discharging device |
Noboru Tokumasu, Kazuo Maeda, Junichi Aoki |
1998-11-10 |
