Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5183511 | Photo CVD apparatus with a glow discharge system | Shunpei Yamazaki, Shigenori Hayashi, Takashi Inujima | 1993-02-02 |
| 5147822 | Plasma processing method for improving a package of a semiconductor device | Shunpei Yamazaki, Mitsunori Tsuchiya, Kazuo Urata, Itaru Koyama, Shinji Imatou +4 more | 1992-09-15 |
| 5079031 | Apparatus and method for forming thin films | Shunpei Yamazaki, Shinji Imatou, Noriya Ishida, Mari Sasaki, Mitsunori Sakama +6 more | 1992-01-07 |
| 5059502 | Electrophotographic photoconductor | Narihito Kojima, Hiroshi Nagame, Mitsuru Seto, Shunpei Yamazaki, Shigenori Hayashi +3 more | 1991-10-22 |
| 5041201 | Plasma processing method and apparatus | Shunpei Yamazaki, Mitsunori Tsuchiya, Shigenori Hayashi, Noriya Ishida, Mari Sasaki +1 more | 1991-08-20 |
| 5039548 | Plasma chemical vapor reaction method employing cyclotron resonance | Takashi Inushima | 1991-08-13 |
| 5013688 | Method of manufacturing a semiconductor using plasma processing | Shunepi Yamazaki, Kazuo Urata, Itaru Koyama, Noriya Ishida, Mari Sasaki +2 more | 1991-05-07 |
| 4973883 | Plasma processing apparatus with a lisitano coil | Takashi Inugima, Toru Takayama | 1990-11-27 |
| 4950624 | Method of depositing films using photo-CVD with chamber plasma cleaning | Takashi Inuzima, Shigenori Hayashi, Toru Takayama, Seiichi Odaka | 1990-08-21 |
| 4949004 | Gas discharge lamp having temperature controlled, liquid reservoir for liquified portion of gas | Shunpei Yamazaki, Takashi Inujima, Kazuo Urata, Mamoru Tashiro, Yuji Tanamura +4 more | 1990-08-14 |
| 4926791 | Microwave plasma apparatus employing helmholtz coils and ioffe bars | Takashi Inujima, Toru Takayama | 1990-05-22 |
| 4887548 | Thin film manufacturing system | Kazuo Urata, Shigenori Hayashi | 1989-12-19 |
| 4803095 | Chemical vapor reaction process by virtue of uniform irradiation | Shigenori Hayashi, Takashi Inujima, Kenji Ito | 1989-02-07 |
| 4768464 | Chemical vapor reaction apparatus | Shigenori Hayashi, Takashi Inujima, Kenji Ito | 1988-09-06 |