UC

Uri Cohen

ST Seagate Technology: 10 patents #565 of 4,626Top 15%
RN Rotem Amfert Negev: 2 patents #3 of 14Top 25%
BL Bell Telephone Laboratories: 1 patents #567 of 1,445Top 40%
MS Motorola Solutions: 1 patents #1,044 of 2,212Top 50%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
Overall (All Time): #51,071 of 4,157,543Top 2%
52
Patents All Time

Issued Patents All Time

Showing 25 most recent of 52 patents

Patent #TitleCo-InventorsDate
10096547 Metallic interconnects products 2018-10-09
9911614 Methods for activating openings for jets electroplating 2018-03-06
9673090 Seed layers for metallic interconnects 2017-06-06
9530653 High speed electroplating metallic conductors 2016-12-27
9278890 Continuous process for manufacturing freely flowing solid acidic P/K fertilizer Talia Aviv, Doron Orgil, Itsik Aroch 2016-03-08
9273409 Electroplated metallic conductors 2016-03-01
9216930 Continuous process for manufacturing a neutral granular P/K fertilizer Talia Aviv, Doron Orgil, Itsik Aroch 2015-12-22
9161272 Method and apparatus to achieve lossless call in view of a temporary reception issue Gabi Ofir, David Bar-On 2015-10-13
8685221 Enhanced electrochemical deposition filling 2014-04-01
8603242 Floating semiconductor foils Michael Roitberg 2013-12-10
8586471 Seed layers for metallic interconnects and products 2013-11-19
8501139 Floating Si and/or Ge foils 2013-08-06
8349149 Apparatus for enhanced electrochemical deposition 2013-01-08
8123861 Apparatus for making interconnect seed layers and products 2012-02-28
7709958 Methods and structures for interconnect passivation 2010-05-04
7682496 Apparatus for depositing seed layers 2010-03-23
7573133 Interconnect structures and methods for their fabrication 2009-08-11
7550386 Advanced seed layers for interconnects 2009-06-23
7282445 Multiple seed layers for interconnects 2007-10-16
7247563 Filling high aspect ratio openings by enhanced electrochemical deposition (ECD) 2007-07-24
7199052 Seed layers for metallic interconnects 2007-04-03
7105434 Advanced seed layery for metallic interconnects 2006-09-12
6924226 Methods for making multiple seed layers for metallic interconnects 2005-08-02
6903016 Combined conformal/non-conformal seed layers for metallic interconnects 2005-06-07
6869515 Enhanced electrochemical deposition (ECD) filling of high aspect ratio openings 2005-03-22