| 7108001 |
Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom |
Keith Pope, Laura Rothman, Rick White, Clifton Busby, Stephen Douglas +1 more |
2006-09-19 |
| 6935352 |
Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displays |
— |
2005-08-30 |
| 6624081 |
Enhanced etching/smoothing of dielectric surfaces |
Jerald P. Dykstra, Wesley Skinner, Allen R. Kirkpatrick |
2003-09-23 |
| 6612317 |
Supercritical fluid delivery and recovery system for semiconductor wafer processing |
Michael Costantini, Mohan Chandra, Heiko Moritz, Ijaz Jafri, Rick M. Heathwaite |
2003-09-02 |
| 6602349 |
Supercritical fluid cleaning process for precision surfaces |
Mohan Chandra, Michael Costantini, Heiko Moritz, Ijaz Jafri, Jim Boyd +1 more |
2003-08-05 |
| 6331227 |
Enhanced etching/smoothing of dielectric surfaces |
Jerald P. Dykstra, Wesley Skinner, Allen R. Kirkpatrick |
2001-12-18 |