NF

Noritaka Fukuo

ST Sandisk Technologies: 13 patents #223 of 2,224Top 15%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
📍 Yokkaichi, JP: #273 of 2,072 inventorsTop 15%
Overall (All Time): #344,669 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
10886366 Semiconductor structures for peripheral circuitry having hydrogen diffusion barriers and method of making the same 2021-01-05
10734400 Three-dimensional memory device including bit lines between memory elements and an underlying peripheral circuit and methods of making the same Masayuki Hiroi 2020-08-04
10256167 Hydrogen diffusion barrier structures for CMOS devices and method of making the same Hokuto KODATE, Eiichi Fujikura, Akinori Yutani, Kengo Miura, Masaomi Koizumi +1 more 2019-04-09
9847249 Buried etch stop layer for damascene bit line formation Yuji Takahashi, Takuya Futase, Katsuo Yamada, Tomoyasu Kakegawa 2017-12-19
9799527 Double trench isolation Katsuo Yamada, Yuji Takahashi, Takuya Futase, Tomoyasu Kakegawa 2017-10-24
9768183 Source line formation and structure Shunsuke Akimoto, Hidetoshi Nakamoto, Keita Kumamoto, Hidehito Koseki, Yuji Takahashi +2 more 2017-09-19
9666479 Patterning method for low-k inter-metal dielectrics and associated semiconductor device 2017-05-30
9607997 Metal line with increased inter-metal breakdown voltage Katsuo Yamada, Yuji Takahashi, Masami Uozaki, Kiyokazu Shishido, Takuya Futase +1 more 2017-03-28
9524904 Early bit line air gap formation Hiroto Ohori, Takuya Futase, Yuji Takahashi, Toshiyuki Sega, Kiyokazu Shishido +1 more 2016-12-20
9478461 Conductive line structure with openings Kiyokazu Shishido, Takuya Futase, Hiroto Ohori, Kotaro Jinnouchi, Yuji Takahashi +1 more 2016-10-25
9401304 Patterning method for low-k inter-metal dielectrics and associated semiconductor device 2016-07-26
9391606 Semiconductor integrated circuit device Hideki Aono, Eiichi Murakami 2016-07-12
9391081 Metal indentation to increase inter-metal breakdown voltage Kiyokazu Shishido, Takuya Futase, Yuji Takahashi, Shunsuke Watanabe, Katsuo Yamada +1 more 2016-07-12
9177853 Barrier layer stack for bit line air gap formation Takuya Futase, Katsuo Yamada, Tomoyasu Kakegawa, Yuji Takahashi 2015-11-03