Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8970039 | Integrated circuit devices including electrode support structures and methods of fabricating the same | Bong-Jin Kuh, Sang-Ryol Yang, Soon-Wook Jung, Byung-Hong Chung, Han-Mei Choi +1 more | 2015-03-03 |
| 8617950 | Method of forming a capacitor and method of manufacturing a semiconductor device using the same | Bong-Jin Kuh, Jong-Cheol Lee, Yong-Suk Tak, Kyu-Ho Cho, Jong-Sung Lim | 2013-12-31 |
| 8241979 | Method of forming a vertical diode and method of manufacturing a semiconductor device using the same | Sang Jin Park, Kong-Soo Lee, Yong-Woo Hyung, Jae-Jong Han | 2012-08-14 |
| 8043974 | Semiconductor wet etchant and method of forming interconnection structure using the same | Jung-Dae Park, Tae-Hyo Choi, Hun-Jung Yi, Kun-Hyung Lee | 2011-10-25 |
| 7902059 | Methods of forming void-free layers in openings of semiconductor substrates | Jung-Hwan Kim, Hun-Hyeoung Leam, Jai-Dong Lee, Young Seok Kim, Ki-Su Na +1 more | 2011-03-08 |
| 7803679 | Method of forming a vertical diode and method of manufacturing a semiconductor device using the same | Sang Jin Park, Kong-Soo Lee, Yong-Woo Hyung, Jae-Jong Han | 2010-09-28 |
| 7741222 | Etch stop structure and method of manufacture, and semiconductor device and method of manufacture | Jae Young Park, Won-Shik Shin, Hyeon-Deok Lee, Ki-Vin Im, Seok-Woo Nam +3 more | 2010-06-22 |
| 7736963 | Method of forming a gate structure for a semiconductor device and method of forming a cell gate structure for a non-volatile memory device | Woong Lee, Hun-Hyeoung Leam, Yong-Woo Hyung, Jai-Dong Lee, Ki-Su Na +1 more | 2010-06-15 |
| 7629217 | Methods of forming void-free layers in openings of semiconductor substrates | Jung-Hwan Kim, Hun-Hyeoung Leam, Jai-Dong Lee, Young Seok Kim, Ki-Su Na +1 more | 2009-12-08 |
| 7563677 | Recessed gate electrode and method of forming the same and semiconductor device having the recessed gate electrode and method of manufacturing the same | Dae-Han Yoo, Kong-Soo Lee, Chang-Hoon Lee, Yong-Woo Hyung, Hyeon-Deok Lee +2 more | 2009-07-21 |
| 7524747 | Floating gate memory device and method of manufacturing the same | Hun-Hyeoung Leam, Sang Hoon Lee | 2009-04-28 |
| 7521375 | Method of forming an oxinitride layer | Hun-Hyeoung Leam, Seok-Woo Nam, Bong-Hyun Kim, Woong Lee, Sang Hoon Lee | 2009-04-21 |
| 7459364 | Methods of forming self-aligned floating gates using multi-etching | Sang Hoon Lee, Hun-Hyeoung Leam, Jai-Dong Lee, Jung-Hwan Kim, Ki-Su Na +3 more | 2008-12-02 |
| 7410869 | Method of manufacturing a semiconductor device | Hun-Hyeoung Leam, Hyeon-Deok Lee, Won-Jun Jang, Woong Lee, Jung-Hyun Park +3 more | 2008-08-12 |
| 7297620 | Method of forming an oxide layer including increasing the temperature during oxidation | Hun-Hyeoung Leam, Seok-Woo Nam, Bong-Hyun Kim, Woong Lee, Sang Hoon Lee | 2007-11-20 |
| 7223657 | Methods of fabricating flash memory devices with floating gates that have reduced seams | Won-Jun Jang, Jung-Hwan Kim, Jai-Dong Lee, Sang Hun Lee, Hun-Hyeoung Leam | 2007-05-29 |
| 7189661 | Method of forming silicon oxynitride layer in semiconductor device and apparatus of forming the same | Cheol-Kyu Yang, Woong Lee, Jae Chul Lee, Hun-Hyeoung Leam | 2007-03-13 |
| 7160776 | Methods of forming a gate structure of a non-volatile memory device and apparatus for performing the same | Ki-Su Na, Hun-Hyeoung Leam, Woong Lee | 2007-01-09 |
| 7077929 | Apparatus for manufacturing a semiconductor device | Jae Woong Kim | 2006-07-18 |
| 7041558 | Floating gate memory device and method of manufacturing the same | Hun-Hyeoung Leam, Sang Hoon Lee | 2006-05-09 |
| 6913979 | Method of manufacturing a metal oxide semiconductor transistor | Hyeon-Deok Lee, Tae Soo Park, Heon-Heoung Leam, Bong-Hyun Kim, Yong-Woo Hyung | 2005-07-05 |
| 6797561 | Method of fabricating a capacitor of a semiconductor device | Chang Hyun Ko, Jai-Dong Lee, Ki-Hyun Hwang | 2004-09-28 |
| 6706613 | Methods for manufacturing stacked gates including oxide/nitride/oxide (ONO) interlayer dielectrics using pre-annealing and/or post-annealing in nitrogen | Hun-Hyeoung Lim, Sang Hoon Lee, Woo Sung Lee | 2004-03-16 |