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Methods of forming dual damascene structures |
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Methods of forming semiconductor devices |
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2011-10-18 |
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Methods of manufacturing a semiconductor device using a layer suspended across a trench |
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Phase change memory devices and methods for fabricating the same |
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Method of manufacturing integrated circuit device including recessed channel transistor |
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Dual damascene structure and methods of forming the same |
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Method of manufacturing integrated circuit device including recessed channel transistor |
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2008-02-05 |
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MOS transistor with recessed gate and method of fabricating the same |
Jong-Chul Park |
2007-01-02 |
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Method for forming a self-aligned contact hole in a semiconductor device |
Jun Seo |
2004-10-26 |
| 6239022 |
Method of fabricating a contact in a semiconductor device |
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2001-05-29 |
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Method of making intermetal dielectric layers having a low dielectric constant |
Ho-Seong Ko, Tae Ryong Kim, Chung-howan Kim, Dong-Yun Kim |
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Plasma etching apparatus having a sealing member coupling an upper electrode to an etching chamber |
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2000-06-13 |
