Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sputtering target, manufacturing method thereof, and manufacturing method of semiconductor element

Sputtering target, manufacturing method thereof, and manufacturing method of semiconductor element

US Patent RE47788 · Granted Dec 31, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Antenna device, detection device, opening/closing unit control system, and occup2025
Umami-enhancing composition, seasoning or extract, method for manufacturing umam2025
Electronic device and wrist device2025
Brazing material, bonded body, ceramic circuit board, and method for manufacturi2025
Electronic device and antenna characteristic adjusting method2025
Silicon nitride sintered body, silicon nitride substrate, and silicon nitride ci2025
Method for manufacturing a ceramic copper circuit board2024
Bonded body, ceramic copper circuit board, method for manufacturing bonded body,2024
Bonded body, ceramic copper circuit substrate, and semiconductor device2024
Electronic device and wrist device2024
Thermoelectric material, manufacturing method of thermoelectric material, thermo2024
Solar panel, electronic device, and electronic timepiece2023