Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods of controlling a manufacturing process for a microelectronic component

Systems and methods of controlling a manufacturing process for a microelectronic component

US Patent 9995692 · Granted Jun 12, 2018

Estimated economic value: $33,342,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for non-destructive metrology of thin layers2024
Process control of semiconductor fabrication based on spectra quality metrics2022
Apparatus and related method to control radiation transmission through mask patt2021
Measuring complex structures in semiconductor fabrication2020
Three-dimensional scatterometry for measuring dielectric thickness2019
Scatterometry method and system2019
Planar metrology pad adjacent a set of fins of a fin field effect transistor dev2018
Measurement system and method for measuring in thin films2018
Three-dimensional scatterometry for measuring dielectric thickness2018
Automated hybrid metrology for semiconductor device fabrication2016
Decoupling measurement of layer thicknesses of a plurality of layers of a circui2016
Systems and methods for fabricating semiconductor device structures2015