Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of stripping photoresist on a single substrate system

Method of stripping photoresist on a single substrate system

US Patent 9875916 · Granted Jan 23, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

UV-assisted stripping of hardened photoresist to create chemical templates for d2022
System and method for enhanced removal of metal hardmask using ultra violet trea2020
Systems and methodologies for vapor phase hydroxyl radical processing of substra2019
UV-assisted stripping of hardened photoresist to create chemical templates for d2019
Method and hardware for enhanced removal of post etch polymer and hardmask remov2019
Substrate cleaning method and system using atmospheric pressure atomic oxygen2019
Process gas generation for cleaning of substrates2018
Etch system and method for single substrate processing2017
Controlling cleaning of a layer on a substrate using nozzles2017
Method and system of process chemical temperature control using an injection noz2016
Line pattern collapse mitigation through gap-fill material application2016
Sonic energy to generate active species for surface preparation, cleaning, and e2016