Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor structure and methods of forming the same

Semiconductor structure and methods of forming the same

US Patent 9824969 · Granted Nov 21, 2017

Estimated economic value: $4,185,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Tuning threshold voltage in field-effect transistors2025
Semiconductor device having doped gate dielectric layer and method for forming t2025
Contact features of semiconductor device and method of forming same2025
Method for forming dual silicide in manufacturing process of semiconductor struc2025
Vacuum chuck2025
Low resistance fill metal layer material as stressor in metal gates2025
FinFET structures and methods of forming the same2025
FinFET structures and methods of forming the same2025
Semiconductor device2025
Metal caps for gate structures2025
Contact with a silicide region2025
Interconnect structure of semiconductor device2025