Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Block copolymer and associated photoresist composition and method of forming an electronic device

Block copolymer and associated photoresist composition and method of forming an electronic device

US Patent 9815930 · Granted Nov 14, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Safety production management system for power plant2025
Photoresists comprising multiple acid generator compounds2025
Photoresist compositions and pattern formation methods2025
Hard disk drive (HDD) with acoustic noise detection2025
Photoacid-generating monomer, polymer derived therefrom, photoresist composition2024
Monomers, polymers and lithographic compositions comprising same2024
Salts and photoresists comprising same2024
Photoresist compositions and pattern formation methods2023
Photoacid-generating monomer, polymer derived therefrom, photoresist composition2023
Zwitterion compounds and photoresists comprising same2022
Shortcut generation2022
Salts and photoresists comprising same2022