Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Monomers, polymers and lithographic compositions comprising same

Monomers, polymers and lithographic compositions comprising same

US Patent 11932713 · Granted Mar 19, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoacid generators, photoresist compositions, and pattern formation methods2025
Aromatic underlayer2025
Adhesion promoting photoresist underlayer composition2025
Photoresists comprising multiple acid generator compounds2025
Underlayer compositions and patterning methods2025
Underlayer compositions and patterning methods2025
Photoresist compositions and pattern formation methods2025
Photoresist compositions and pattern formation methods2025
Photoresist compositions and pattern formation methods2025
Photoacid generators, photoresist compositions, and pattern formation methods2024
Aromatic underlayer2024
Photoresist compositions and pattern formation methods2024