Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Bi-directional double-pass multi-beam writing

Bi-directional double-pass multi-beam writing

US Patent 9799487 · Granted Oct 24, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Beam pattern device having beam absorber structure2024
Pattern data processing for programmable direct-write apparatus2024
Method for irradiating a target using restricted placement grids2023
Charged-particle source and method for cleaning a charged-particle source using 2020
Non-linear dose- and blur-dependent edge placement correction2020
Dose-related feature reshaping in an exposure pattern to be exposed in a multi b2019
Multi-beam writing using inclined exposure stripes2019
Method for compensating pattern placement errors caused by variation of pattern 2019
Advanced dose-level quantization of multibeam-writers2019
Multi-beam writing of pattern areas of relaxed critical dimension2017
Correction of short-range dislocations in a multi-beam writer2017
Compensation of imaging deviations in a particle-beam writer using a convolution2016