Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Charged-particle source and method for cleaning a charged-particle source using back-sputtering

Charged-particle source and method for cleaning a charged-particle source using back-sputtering

US Patent 10840054 · Granted Nov 17, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electromagnetic lens2025
Correction of blur variation in a multi-beam writer2025
Beam pattern device having beam absorber structure2024
Pattern data processing for programmable direct-write apparatus2024
Pattern data processing for programmable direct-write apparatus2024
Charged-particle source2023
Charged-particle source2023
Method for irradiating a target using restricted placement grids2023
Method for irradiating a target using restricted placement grids2023
Adapting the duration of exposure slots in multi-beam writers2021
Non-linear dose- and blur-dependent edge placement correction2020
Non-linear dose- and blur-dependent edge placement correction2020