Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and apparatus for optimization of inspection speed by generation of stage speed profile and selection of care areas for automated wafer inspection

Methods and apparatus for optimization of inspection speed by generation of stage speed profile and selection of care areas for automated wafer inspection

US Patent 9780004 · Granted Oct 3, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electron-optical system for high-speed and high-sensitivity inspections2014
Multiple-beam system for high-speed electron-beam inspection2013
High-sensitivity and high-throughput electron beam inspection column enabled by 2012
Charge-control pre-scanning for e-beam imaging2007
Apparatus and methods for optically inspecting a sample for anomalies2006
Apparatus and methods for optically inspecting a sample for anomalies2004
Method and apparatus for optical inspection of substrates2002
Electron beam inspection system and method1996
Automatic high speed optical inspection system1992
Automatic high speed optical inspection system1992
Method and apparatus for optical inspection of substrates1989