Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Efficient solution for removing EUV native defects

Efficient solution for removing EUV native defects

US Patent 9759998 · Granted Sep 12, 2017

Estimated economic value: $3,593,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Liquid-crystal medium comprising poylmerizable compounds2025
Liquid-crystal medium comprising polymerizable compounds2024
Method to fabricate mask-pellicle system2020
Photomask and fabrication method therefor2020
Focused radiation beam induced deposition2018
Focused radiation beam induced deposition2018
Method for repairing a mask2018
Method for repairing a mask2018
Focused radiation beam induced deposition2018
Focused radiation beam induced deposition2018
Method for repairing a mask2018
Method to fabricate mask-pellicle system2017