Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for manufacturing fine pattern using interferogram of optical axis direction

Apparatus and method for manufacturing fine pattern using interferogram of optical axis direction

US Patent 9707714 · Granted Jul 18, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Calibration method for deflectometry method, for improving measurement accuracy2025
Thin film deposition apparatus2025
Method for manufacturing nucleic acid film and apparatus for injecting medicine 2025
Vibration insensitive interferometry for measuring thickness and profile of mult2025
Device and method for measuring thickness and refractive index of multilayer thi2024
System and method for 3D shape measurement of freeform surface based on high-spe2022
Apparatus and method for measuring the thickness and refractive index of multila2022
System and method for compensating for non-linear response characteristic in pha2022
Apparatus and method for multilayer thin film thickness measurement using single2022
Method for manufacturing nucleic acid film and apparatus for injecting medicine 2021
Apparatus for measuring thickness and surface profile of multilayered film struc2019
Apparatus for measuring thickness and surface profile of multilayered film struc2019