Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition

Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition

US Patent 9676892 · Granted Jun 13, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus with memory management based on memory group2025
Method of manufacturing semiconductor fabrication system2024
Resist composition2023
Photo-decomposable compound, photoresist composition including the same, and met2023
Method of manufacturing a semiconductor device including a plurality of channel 2021
Material for detecting photoresist and method of fabricating semiconductor devic2021
Method of producing layer structure, layer structure, and method of forming patt2019
Methods of forming a low-k dielectric layer and methods of fabricating a semicon2018
Composition for manufacturing semiconductor device and method of manufacturing s2018
Methods of forming hardmask material film2018
Composition for manufacturing semiconductor device and method of manufacturing s2017
Method of fabricating semiconductor device2017