Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process chamber apparatus, systems, and methods for controlling a gas flow pattern

Process chamber apparatus, systems, and methods for controlling a gas flow pattern

US Patent 9530623 · Granted Dec 27, 2016

Estimated economic value: $14,994,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and systems for temperature control for a substrate2025
Substrate transfer systems and methods of use thereof2025
Methods and apparatus for processing a substrate2025
Electronic device manufacturing system2025
Substrate transfer devices, systems and methods of use thereof2025
Robot apparatus, systems, and methods for transporting substrates in electronic 2025
Micro-electromechanical device for use in a flow control apparatus2025
Operations of robot apparatuses within rectangular mainframes2025
Color-changing torque seal for electrical connections2024
Process kit enclosure system2024
Substrate transfer systems and methods of use thereof2024
Autoteach system2024