Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electrostatic remote plasma source system and method

Electrostatic remote plasma source system and method

US Patent 9524854 · Granted Dec 20, 2016

Estimated economic value: $13,638,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus to produce a waveform2025
Apparatus to produce a waveform2025
Apparatus to produce a waveform2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
Apparatus to control ion energy2025
Spatial control of plasma processing environments2024
Spatial control of plasma processing environments2024
Apparatus to control a waveform2024
Apparatus to control a waveform2024
Apparatus to control a waveform2024