Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Distribution of gas over a semiconductor wafer in batch processing

Distribution of gas over a semiconductor wafer in batch processing

US Patent 9493874 · Granted Nov 15, 2016

Estimated economic value: $8,656,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Inter-layer insulator for electronic devices and apparatus for forming same2022
Self-aligned trench isolation in integrated circuits2019
Memory device with multi-layer channel and charge trapping layer2018
Self-aligned trench isolation in integrated circuits2017
Self-aligned trench isolation in integrated circuits2016
Buried trench isolation in integrated circuits2016
Formation of gate sidewall structure2016
Methods for fabricating memory cells having fin structures with semicircular top2015
Patterned dummy wafers loading in batch type CVD2014
Memory cell system with multiple nitride layers2014
Method for forming a semiconductor layer with improved gap filling properties2014
Gate replacement with top oxide regrowth for the top oxide improvement2013