Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Wafer chucking system for advanced plasma ion energy processing systems

Wafer chucking system for advanced plasma ion energy processing systems

US Patent 9435029 · Granted Sep 6, 2016

Estimated economic value: $10,382,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus to produce a waveform2025
Apparatus to produce a waveform2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
System, method, and apparatus for controlling ion energy distribution in plasma 2025
Apparatus to control ion energy2025
Spatial control of plasma processing environments2024
Apparatus to control a waveform2024
Apparatus to control a waveform2024
Systems and methods for monitoring faults, anomalies, and other characteristics 2024
Systems and methods for monitoring faults, anomalies, and other characteristics 2024
Apparatus with switches to produce a waveform2024
Apparatus with switches to produce a waveform2024