Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium

Temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium

US Patent 9431281 · Granted Aug 30, 2016

Estimated economic value: $40,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Etching apparatus2021
Heat treatment method and heat treatment apparatus for semiconductor substrate2018
Substrate heat treatment apparatus2017
Substrate heat treatment apparatus2017
Heat treatment apparatus and semiconductor device manufacturing method2015
Substrate heat treating apparatus, temperature control method of substrate heat 2014
Substrate heat treating apparatus, temperature control method of substrate heat 2014
Substrate processing apparatus, substrate annealing method, and semiconductor de2013
Annealing method for semiconductor device with silicon carbide substrate and sem2012
Substrate processing method and method of manufacturing crystalline silicon carb2012
Substrate supporting/transferring tray2012
Heating process apparatus2012