Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Providing electron beam proximity effect correction by simulating write operations of polygonal shapes

Providing electron beam proximity effect correction by simulating write operations of polygonal shapes

US Patent 9418191 · Granted Aug 16, 2016

Estimated economic value: $2,289,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for integrated circuit design and fabrication2025
Method of fabricating semiconductor device with reduced trench distortions2025
Semiconductor device and manufacturing method of semiconductor device2025
Magnetic device and magnetic random access memory2025
Memory device2025
Integrated circuit and method of manufacturing same2025
Photovoltaic panel packaging structure and method for the same2025
MRAM stacks, MRAM devices and methods of forming the same2025
Pattern fidelity enhancement2025
Semiconductor device including source/drain contact having height below gate sta2025
Magnetic tunneling junction with synthetic free layer for SOT-MRAM2025
SOT-MRAM with shared selector2025