Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gas

Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gas

US Patent 9410244 · Granted Aug 9, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method to process wafers2025
Substrate processing apparatus, reactor mover for moving a reactor of the appara2025
Apparatus for processing a plurality of substrates provided with an extractor ch2025
Wafer processing apparatus with a rotatable table2025
Flange and apparatus for processing substrates2025
Cassette lid opening device2025
Apparatus and methods for performing an in-situ etch of reaction chambers with f2025
Substrate processing apparatus for processing substrates2024
Chemical vapor deposition furnace with a cleaning gas system to provide a cleani2024
Automatic system calibration for wafer handling2024
Injector2024
Batch furnace assembly and method of operating a batch furnace assembly2024