Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › PECVD films for EUV lithography

PECVD films for EUV lithography

US Patent 9304396 · Granted Apr 5, 2016

Estimated economic value: $17,385,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integration of dry development and etch processes for EUV patterning in a single2025
Tin oxide films in semiconductor device manufacturing2025
Tin oxide films in semiconductor device manufacturing2025
Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-laye2025
Eliminating yield impact of stochastics in lithography2025
Tin oxide films in semiconductor device manufacturing2024
Tin oxide films in semiconductor device manufacturing2022
Eliminating yield impact of stochastics in lithography2022
Method of controlling a patterning process, lithographic apparatus, metrology ap2021
Modification of SNO2 surface for EUV lithography2021
Eliminating yield impact of stochastics in lithography2020
Etching substrates using ALE and selective deposition2020