Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming seed layer, method of forming silicon film, and film forming apparatus

Method of forming seed layer, method of forming silicon film, and film forming apparatus

US Patent 9263256 · Granted Feb 16, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Injector and substrate processing apparatus using the same, and substrate proces2023
Support method, design support apparatus, and a non-transitory recording medium 2022
Three-dimensional memory device containing compositionally graded word line diff2022
Three-dimensional memory devices containing structures for controlling gate-indu2021
Three-dimensional memory devices containing structures for controlling gate-indu2021
Substrate processing apparatus, substrate loading method, and substrate processi2021
Etching method and etching apparatus2020
Substrate processing apparatus2020
Three-dimensional memory device containing compositionally graded word line diff2020
Heating method, film forming method, semiconductor device manufacturing method, 2019
Control logic diagram analysis device and control logic diagram analysis method2019
Field effect transistors having different stress control liners and method of ma2019