Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition of matter and molecular resist made therefrom

Composition of matter and molecular resist made therefrom

US Patent 9229322 · Granted Jan 5, 2016

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fullerene derivative blends, methods of making and uses thereof2025
Luminescent compounds2024
Fullerene derivative blends, methods of making and uses thereof2024
Luminescent compounds2024
Hard-mask composition2023
Hard-mask composition2023
Hard-mask composition2023
Fullerene derivative blends, methods of making and uses thereof2023
Enhanced EUV photoresist materials, formulations and processes2023
Enhanced EUV photoresist materials, formulations and processes2023
Enhanced EUV photoresist materials, formulations and processes2023
Enhanced EUV photoresist materials, formulations and processes2023