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Hard-mask composition |
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Enhanced EUV photoresist materials, formulations and processes |
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Multiple trigger monomer containing photoresist compositions and method |
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Hard-mask composition |
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2019-10-08 |
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Multiple trigger photoresist compositions and methods |
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2018-10-09 |
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Composition of matter and molecular resist made therefrom |
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Composition of matter and molecular resist made therefrom |
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Composition of matter and molecular resist made therefrom |
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