Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for measuring a stacking overlay error by focusing on one of upper and lower layer overlay marks using a differential interference contrast microscope

Method and system for measuring a stacking overlay error by focusing on one of upper and lower layer overlay marks using a differential interference contrast microscope

US Patent 9182681 · Granted Nov 10, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sample depth-measuring device and method2025
Heterogeneous integration detecting method and heterogeneous integration detecti2024
Three-dimension measurement device and operation method thereof2022
Scattering measurement system and method2018
Measurement system2017
Measurement systems and measurement methods2014
Measurement systems and measurement methods2014
System, method and computer readable medium for through silicon via structure me2014
Method for measuring via bottom profile2013
Method for measuring via bottom profile2013
Method for designing overlay targets and method and system for measuring overlay2013
Scatterfield microscopical measuring method and apparatus2012