Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic method

Lithographic method

US Patent 9086633 · Granted Jul 21, 2015

Estimated economic value: $23,734,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Curved reticle by mechanical and phase bending along orthogonal axes2025
Illumination system with curved 1d-patterned mask for use in EUV-exposure tool2022
Euv lithography system for dense line patterning2021
EUV lithography system for dense line patterning2021
Dynamic patterning method that removes phase conflicts and improves pattern fide2019
Using customized lens pupil optimization to enhance lithographic imaging in a so2018
Lithographic substrate and a device2016
Fast illumination simulator based on a calibrated flexible point-spread function2015
Fast photoresist model2014
Method or matching high-numerical aperture scanners2013
Optimized polarization illumination2013
Device manufacturing method and mask for use therein2012