Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner

Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner

US Patent 10310387 · Granted Jun 4, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Curved reticle by mechanical and phase bending along orthogonal axes2025
Illumination system with curved 1d-patterned mask for use in EUV-exposure tool2022
Euv lithography system for dense line patterning2021
Array description system for large patterns2021
EUV lithography system for dense line patterning2021
Forced grid method for correcting mask patterns for a pattern transfer apparatus2020
Increasing and controlling sensitivity of non-linear metallic thin-film resists2019
Microelectromechanical mirror assembly2019
Using customized lens pupil optimization to enhance lithographic imaging in a so2018
Microelectromechanical mirror assembly2018
Increasing and controlling sensitivity of non-linear metallic thin-film resists2017
Lithographic substrate and a device2016