Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for forming a semiconductor gate

Method and apparatus for forming a semiconductor gate

US Patent 9070663 · Granted Jun 30, 2015

Estimated economic value: $5,641,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device having improved electrostatic discharge protection2025
Semiconductor structure and associated fabricating method2025
Method of forming a transistor device with a gate structure having a pair of rec2024
Method for forming an IC including a varactor with reduced surface field region2024
Power MOSFETs structure2024
Semiconductor device having improved electrostatic discharge protection2024
Semiconductor device having improved electrostatic discharge protection2023
Semiconductor device2022
Semiconductor device2022
Semiconductor structure and associated fabricating method2022
Transistor device with a gate structure having recesses overlying an interface b2022
Semiconductor device having improved electrostatic discharge protection2022