Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system

Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system

US Patent 9012874 · Granted Apr 21, 2015

Estimated economic value: $5,039,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and systems useful for producing aluminum ions2025
Method and systems useful for producing aluminum ions2024
Germanium tetraflouride and hydrogen mixtures for an ion implantation system2023
Ion implantation system with mixture of arc chamber materials2023
Fluorine ion implantation system with non-tungsten materials and methods of usin2022
Systems and methods for generating custom assembly instructions for product pack2022
Adsorbent-based, mechanically-regulated gas storage and delivery vessel2022
Germanium tetraflouride and hydrogen mixtures for an ion implantation system2022
Ion implantation system with mixture of arc chamber materials2021
Silicon implantation in substrates and provision of silicon precursor compositio2021
Silicon implantation in substrates and provision of silicon precursor compositio2021
Silicon implantation in substrates and provision of silicon precursor compositio2021