Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hydrogen plasma cleaning of germanium oxide surfaces

Hydrogen plasma cleaning of germanium oxide surfaces

US Patent 8987143 · Granted Mar 24, 2015

Estimated economic value: $1,253,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated low k recovery and ALD metal deposition process for advanced technolo2025
Deposition of boron films2025
Two-dimension self-aligned scheme with subtractive metal etch2025
Tin oxide and tin carbide materials for semiconductor patterning applications2025
Method of in situ ceramic coating deposition2025
Methods, systems, and apparatus for processing substrates using one or more amor2024
Atomic layer etching of Ru metal2024
Treatment for high-temperature cleans2023
Methods, systems, and apparatus for processing substrates using one or more amor2023
Method of in situ ceramic coating deposition2023
Methods of reducing chamber residues2023
Method of forming interconnect for semiconductor device2022