Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Etch rate detection for photomask etching

Etch rate detection for photomask etching

US Patent 8961804 · Granted Feb 24, 2015

Estimated economic value: $19,887,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Adjustable achromatic collimator assembly for endpoint detection systems2024
Etch processing system having reflective endpoint detection2024
Adjustable achromatic collimator assembly for endpoint detection systems2023
Etch processing system having reflective endpoint detection2021
Chamber lid heater ring assembly2020
Dual endpoint detection for advanced phase shift and binary photomasks2019
Plasma reactor having an array of plural individually controlled gas injectors a2019
Dual endpoint detection for advanced phase shift and binary photomasks2017
Inductively coupled plasma reactor having RF phase control and methods of use th2016
Mask etch plasma reactor having an array of optical sensors viewing the workpiec2015
Etch rate detection for anti-reflective coating layer and absorber layer etching2015
Apparatus and methods for etching quartz substrate in photomask manufacturing ap2015