Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for distributing gas for a bevel etcher

Method for distributing gas for a bevel etcher

US Patent 8940098 · Granted Jan 27, 2015

Estimated economic value: $35,923,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compact high density plasma source2025
Atomic layer etch and deposition processing systems including a lens circuit wit2024
Method of etch model calibration using optical scatterometry2023
Pulsed plasma chamber in dual chamber configuration2023
Multi zone gas injection upper electrode system2023
Method and apparatus for determining process rate2021
Systems and methods for calibrating scalar field contribution values for a limit2021
Systems and methods for performing edge ring characterization2021
Method of etch model calibration using optical scatterometry2021
Method of feature exaction from time-series of spectra to control endpoint of pr2020
Deposition apparatus including an isothermal processing zone2020
System and method for determining field non-uniformities of a wafer processing c2020