Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for treatment of substrates with water vapor or steam

Process for treatment of substrates with water vapor or steam

US Patent 8920577 · Granted Dec 30, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for rotating and translating a substrate in a process chambe2022
Systems and methods for treating substrates with cryogenic fluid mixtures2022
System and method for monitoring treatment of microelectronic substrates with fl2021
Systems and methods for treating substrates with cryogenic fluid mixtures2021
Systems and methods for rotating and translating a substrate in a process chambe2020
Systems and methods for treating substrates with cryogenic fluid mixtures2020
Systems and methods for treating substrates with cryogenic fluid mixtures2018
Systems and methods for treating substrates with cryogenic fluid mixtures2018
Systems and methods for treating substrates with cryogenic fluid mixtures2018
Methodologies for rinsing tool surfaces in tools used to process microelectronic2018
Processing system and method for providing a heated etching solution2017
Process for silicon nitride removal selective to SiGex2017