Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pattern data system for high-performance maskless electron beam lithography

Pattern data system for high-performance maskless electron beam lithography

US Patent 8893059 · Granted Nov 18, 2014

Estimated economic value: $13,563,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for compressed data transmission in a maskless lithography sys2016
Pillar-supported array of micro electron lenses2015
Methods of measuring overlay errors in area-imaging e-beam lithography2015
Quasi-annular reflective electron patterning device2013
Electron beam patterning2011
Electron beam lithography method and apparatus using a dynamically controlled ph2010
Method and device for immersion lithography2008
Border modification for proximity effect correction in lithography2002
Specimen distance measuring system1988
Virtual addressing for E-beam lithography1985