Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Solid state source introduction of dopants and additives for a plasma doping process

Solid state source introduction of dopants and additives for a plasma doping process

US Patent 8889534 · Granted Nov 18, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for edge control during plasma processing2025
Non-intrusive method for 2D/3D mapping plasma parameters2025
Plasma processing apparatus with tunable electrical characteristic2025
Plasma processing with magnetic ring X point2025
Pulsed capacitively coupled plasma processes2025
Balanced RF resonant antenna system2025
Plasma processing methods using low frequency bias pulses2025
Plasma processing with broadband RF waveforms2025
ALD process with plasma treatment2025
Method of uniformity control2025
Method of forming a FET structure by selective deposition of film on source/drai2025
Process control enabled VDC sensor for plasma process2025